Current Nanoscience

ISSN: 1573-4137 - Volume 4, 4 Issues, 2008

Editor-in-Chief:

Atta-ur-Rahman, FRS
HEJ Research Institute of Chemistry
University of Karachi, Karachi-75270
Pakistan

Associate Editor:

M. Fan (Georgia Institute of Technology, Atlanta, GA, USA)

Assistant Editor:

K. Avgoustakis (University of Patras, Patras, Greece)

Editorial Advisory Board:

M. J. Alonso (University of Santiago de Compostela (USC), Santiago de Compostela, Spain)
J. Aylott (The University of Nottingham, Nottingham, UK)
C. Berry (University of Glasgow, Glasgow, UK)
H. Boukari (NIH, Bethesda, MD, USA)
T. Burnouf (Human Plasma Product Service, Lille, France)
G.-M. Chow (National University of Singapore, Kent Ridge, Singapore)
P. Couvreur (Universitè de Paris-Sud, Paris, France)
G. Dieckmann (The University of Texas at Dallas, Texas, TX, USA)
B. Dragnea (Indiana University, Bloomington, IN, USA)
D. F. Emerich (LCT BioPharma, Cranston, RI, USA)
H. Fuchs (Free University of Berlin, Berlin, Germany)
R. Gref (Université Paris Sud, Chatenay Malabry, France)
H. Grubmuller (Max Planck Inst. for Biophys. Chem., Gottingen, Germany)
I. Hendry (John Curtin School of Medical Research, Canberra, Australia)
A. Hirabayashi (Hitachi, Ltd., Tokyo, Japan)
S. Hoeppener (Eindhoven University of Technology, Eindhoven, The Netherlands)
T. M. de Hosson (University of Groningen, Groningen, The Netherlands)
M. Z. Hu (Oak Ridge National Laboratory, Oak Ridge, TN, USA)
D. Hui (University of New Orleans, New Orleans, LA, USA)
A. Ikai (Tokyo Institute of Technology, Yokohama, Japan)
D. Ivanov (Free Univesrity of Brussels, Brussels, Belgium)
L. Jia (National Cancer Institute, NIH, Rockville, MD, USA)
I. Karafyllidis (Democritus Univ. Thrace, Xanthi, Greece)
K. Kataoka (The University of Tokyo, Tokyo, Japan)
J. Kreuter (Johann Wolfgang Goethe-Universitaet, Frankfurt, Germany)
I. Levy (Intel Research, Jerusalem, Israel)
C. M. Lieber (Harvard Univ., Cambridge, MA, USA)
Y. Lin (Pacific Northwest National Laboratory, Richland, WA, USA)
G.-R. Lin (National Taiwan University, Taipei, Taiwan)
S. Lyuksyutov (The University of Akron, Akron, OH, USA)
P. Midgley (University of Cambridge, Cambridge, UK)
I. D. Nikolov (University of Sofia, Sofia, Bulgaria)
H. Onishi (Hoshi University, Tokyo, Japan)
S. O'Shea (Institute of Material Research & Engineering, Singapore)
P. Poulin (CNRS, Pessac, France)
G. Pozzi (University of Bologna, Bologna, Italy)
M. Razeghi (Northwestern University, Evanston, IL, USA)
R. Rinaldi (Universidad degli Studi di Lecce, Lecce, Italy)
E. Ruiz-Hitzky(Instituto de Ciencia de Materiales de Madrid, Madrid, Spain)
O. Salata (University of Oxford, Oxford, UK)
S. Scheuring (Inst. Curie, Paris, France)
G. Schneider (Berlin Elektronespeicherring-Gesellschaft fur Synchrotronstrahlung, Berlin, Germany)
N. Seeman (New York University, New York, NY, USA)
P.A. Serena (Instituto de Ciencia de Materiales de Madrid, Madrid, España)
M. Simeonova (Institute of Polymers, Sofia, Bulgaria)
E.B. Souto (Fernando Pessoa University, Porto, Portugal)
V. Thomas (University of Alabama at Birmingham (UAB), Birmingham, AL, USA)
Y. K. Vohra (University of Alabama, Birmingham, AL, USA)
Q. Wang (University of Manitoba, Canada)
A. Wee (National University of Singapore 2 Science Drive 3, Singapore)
J. West (University of Houston, Houston, TX, USA)
X. Wu (Quantum Dot Corporation, Hayward, CA, USA)
A. Yap (National University of Singapore, Lower Kent Ridge Road, Singapore)
S.-H. Yu (University of Science and Technology of China, P.R. China)
M. Zheng (DuPont Cent. Res. and Develop. Exp. Station, Wilmington, DE, USA)
Y. Zhou (Max-Planck Institute of Colloids and Interfaces, Potsdam, Germany)
Ying-Jie Zhu (Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai, China)